METHODS OF FABRICATING LARGE-AREA, SEMICONDUCTING NANOPERFORATED GRAPHENE MATERIALS
摘要
Methods for forming a nanoperforated graphene material are provided. The methods comprise forming an etch mask defining a periodic array of holes over a graphene material and patterning the periodic array of holes into the graphene material. The etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer. The nanoperforated graphene material can consist of a single sheet of graphene or a plurality of graphene sheets.
申请公布号
WO2011094204(A2)
申请公布日期
2011.08.04
申请号
WO2011US22393
申请日期
2011.01.25
申请人
WISCONSIN ALUMNI RESEARCH FOUNDATION;ARNOLD, MICHAEL;GOPALAN, PADMA;SAFRON, NATHANIEL, S.;KIM, MYUNGWOONG