| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin for a photoresist composition capable of forming a pattern having satisfactory exposure margin. <P>SOLUTION: The resin contains a resin comprising a structural unit derived from a compound represented by formula (I) and a structural unit derived from a compound represented by formula (II). In formula (I), R<SP>1</SP>represents a hydrogen atom, a halogen atom or a 1-6 alkyl group that optionally has a halogen atom; X<SP>1</SP>represents a 2-36C heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a 1-24C hydrocarbon group, a 1-12C alkoxy group, a 2-4C acyl group or a 2-4C acyloxy group, and one or more -CH<SB>2</SB>- contained in the heterocyclic group may be replaced by -CO- or -O-. In formula (II), R<SP>31</SP>represents a hydrogen atom, a halogen atom or a 1-6 alkyl group that optionally has a halogen atom; Z<SP>1</SP>represents a single bond or *-[CH<SB>2</SB>]<SB>s3</SB>-CO-L<SP>4</SP>-; L<SP>1</SP>, L<SP>2</SP>, L<SP>3</SP>and L<SP>4</SP>each independently represent -O- or -S-; s1 represents an integer of 1-3; s2 represents an integer of 0-3; s3 represents an integer of 1-4; and * represents direct link to L<SP>1</SP>. <P>COPYRIGHT: (C)2011,JPO&INPIT |
