发明名称 Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system
摘要 <p>A conduit system for a lithographic apparatus includes at least one conduit for guiding a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in said liquid or liquid-gas mixture. In an embodiment the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet for compression of the liquid or liquid-gas mixture. </p>
申请公布号 EP1921503(A3) 申请公布日期 2011.08.03
申请号 EP20070075932 申请日期 2007.10.30
申请人 ASML NETHERLANDS BV 发明人 VAN DEN HEUVEL, MARTINUS WILHELMUS;VUGTS, JOSEPHUS CORNELIUS JOHANNES ANTONIUS;FRANKEN, JOHANNES CHRISTIAAN LEONARDUS
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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