发明名称 Trench MOSFET with trenched floating gates as termination
摘要 A trench MOSFET comprising a plurality of transistor cells with a plurality of wide trenched floating gates as termination region is disclosed. The trenched floating gates have trench depth equal to or deeper than body junction depth of body regions in termination area. Each body region between two adjacent said trenched floating gates has floating voltage.
申请公布号 US7989887(B2) 申请公布日期 2011.08.02
申请号 US20090591467 申请日期 2009.11.20
申请人 FORCE MOS TECHNOLOGY CO., LTD. 发明人 HSIEH FU-YUAN
分类号 H01L27/108 主分类号 H01L27/108
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