发明名称 SEMICONDUCTOR DEVICE, MEASUREMENT APPARATUS, AND MEASUREMENT METHOD OF RELATIVE PERMITTIVITY
摘要 <P>PROBLEM TO BE SOLVED: To improve electric characteristics of a transistor by controlling the value of physical properties of an oxide semiconductor layer, because the field of oxide semiconductors has begun to attract attention in recent years and therefore the correlation between electric characteristics of the transistor including the oxide semiconductor layer and the value of physical properties of the oxide semiconductor layer does not clear yet. <P>SOLUTION: A semiconductor device includes at least a gate electrode 200, an oxide semiconductor layer 410, and a gate insulating layer 300 sandwiched between the gate electrode and the oxide semiconductor layer, wherein the oxide semiconductor layer has a relative permittivity equal to or higher than 13 (or equal to or higher than 14). <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011146692(A) 申请公布日期 2011.07.28
申请号 JP20100273289 申请日期 2010.12.08
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 MIYANAGA SHOJI;HONDA TATSUYA
分类号 H01L29/786;G01R27/26 主分类号 H01L29/786
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