发明名称 SUBSTRATE TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment system capable of restoring a relation with a substrate treatment device before the occurrence of a fault when the system is recovered from fault. SOLUTION: The substrate treatment system includes a plurality of substrate treatment devices 10 that treat a wafer 14, a group management system 3 that manages the substrate treatment devices 10, and a backup system 4 that monitors the group management system 3, and the backup system 4 monitors the operation of the group management system 3, and uses constitution information defining connection constitutions of the group management system 3 to communicate with the substrate treatment devices 10 in the case of the occurrence of a communication abnormality to the group management system. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011146626(A) 申请公布日期 2011.07.28
申请号 JP20100007989 申请日期 2010.01.18
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 MAKINO NOBUHISA;KOYAMA YOSHITAKA
分类号 H01L21/02 主分类号 H01L21/02
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