发明名称 |
METHODS FOR REDUCING THE DEPOSITION OF SILICON ON REACTOR WALLS USING PERIPHERAL SILICON TETRACHLORIDE |
摘要 |
<p>Fluidized bed reactor systems and distributors are disclosed as well as processes for producing polycrystalline silicon from a thermally decomposable silicon compound such as trichlorosilane. The processes generally involve reduction of silicon deposits on reactor walls during polycrystalline silicon production by use of a silicon tetrahalide.</p> |
申请公布号 |
WO2011090689(A1) |
申请公布日期 |
2011.07.28 |
申请号 |
WO2010US62088 |
申请日期 |
2010.12.23 |
申请人 |
MEMC ELECTRONIC MATERIALS, INC.;ERK, HENRY, FRANK |
发明人 |
ERK, HENRY, FRANK |
分类号 |
B01J8/02;B01J8/18;B01J8/24;C01B33/03;C01B33/107;F23C10/20;F23D14/22;F27B15/10 |
主分类号 |
B01J8/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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