发明名称 Radiation source
摘要 <p>A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.</p>
申请公布号 EP1804556(B1) 申请公布日期 2011.07.27
申请号 EP20060256519 申请日期 2006.12.21
申请人 ASML NETHERLANDS BV 发明人 MOORS, JOHANNES HUBERTUS JOSEPHINA;BANINE, VADIM YEVGENYEVICH;FRANKEN, JOHANNES CHRISTIAAN LEONARDUS;IVANOV, VLADIMIR VITALEVITCH;KOSHELEV, KONSTANTIN NIKOLAEVITCH;STRUYCKEN, ALEXANDER MATTHIJS
分类号 H05G2/00 主分类号 H05G2/00
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