发明名称 |
Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
摘要 |
Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
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申请公布号 |
US7985723(B2) |
申请公布日期 |
2011.07.26 |
申请号 |
US20100871275 |
申请日期 |
2010.08.30 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
SAVU PATRICIA M.;LAMANNA WILLIAM M.;PARENT MICHAEL J. |
分类号 |
H01L21/02;C11D1/00;C11D3/02;C11D3/39;C11D11/00 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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