发明名称 |
Method of cleaning a quartz part |
摘要 |
A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to about 55 wt % of an acidic oxidizing agent, from about 5 to about 30 wt % of a fluorine compound and a remaining amount of water. Residual thin films and impurities on the surface of the quartz part may be removed while reducing the damage onto the quartz part.
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申请公布号 |
US7985297(B2) |
申请公布日期 |
2011.07.26 |
申请号 |
US20090500141 |
申请日期 |
2009.07.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JUNG-DAE;JUN PIL-KWON;LEE BO-YONG;CHOI TAE-HYO;LEE DA-HEE;CHAE SEUNG-KI |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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