PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to directly control the temperature of a focus ring by including the focus ring including a coolant path for controlling a temperature. CONSTITUTION: A focus ring(140) surrounds the outer surface of a support stand(130). The focus ring includes a refrigerant path(144) for controlling the temperature. A control unit includes a refrigerant circuit for controlling the temperature. An insulation unit insulates the control unit. An adhesive layer is formed between the control unit and the insulation unit to improve thermal transmission efficiency.