发明名称 |
METHOD OF MANUFACTURING RADIATION-SENSITIVE COMPOSITION AND METHOD OF CONTROLLING FILM THICKNESS OF RESIST FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a radiation-sensitive composition which manufactures a resist film having a film thickness complying with a target film thickness and exhibits a performance of the resist film as it is designed. <P>SOLUTION: The method of manufacturing the radiation-sensitive composition is provided, and includes the process for condensing or diluting a preliminary composition of the radiation-sensitive composition by using a solvent to achieve a particular refractive index based on a correlation relationship between the film thickness of a standard resist film manufactured under a fixed condition by using a standard composition and the refractive index of the standard composition, and for obtaining the radiation-sensitive composition for manufacturing the resist film having the particular film thickness. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011141337(A) |
申请公布日期 |
2011.07.21 |
申请号 |
JP20100000754 |
申请日期 |
2010.01.05 |
申请人 |
JSR CORP |
发明人 |
SHIMIZU DAISUKE;SUGANO MASAKATSU;AOKI TOMOATSU;TERAYAMA KIMIMASA;BABA MICHIKO |
分类号 |
G03F7/039;C08F212/14;C08F220/10;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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