发明名称 TRANSISTOR, METHOD OF MANUFACTURING THE SAME AND ELECTRONIC DEVICE COMPRISING TRANSISTOR
摘要 PURPOSE: A transistor, a manufacturing method thereof, and an electronic device including the same are provided to suppress the property variation of a transistor due to light and moisture by including a second passivation layer including fluorine. CONSTITUTION: A source(S1) and a drain(D1) are connected to both ends of a channel layer(C1). A gate(G1) corresponds to the channel layer. A gate insulation layer(Gl1) is formed between the channel layer and the gate. A first passivation layer(P11,P12) covers the source, the drain, the gate, and the gate insulation layer, and the channel layer. The second passivation layer is formed on the first passivation layer and includes fluorine.
申请公布号 KR20110083934(A) 申请公布日期 2011.07.21
申请号 KR20100003927 申请日期 2010.01.15
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, SUN IL;PARK, JAE CHUL;KIM, SANG WOOK;PARK, YOUNG SOO;KIM, CHANG JUNG
分类号 H01L29/786 主分类号 H01L29/786
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