发明名称 PHOTOCONDUCTIVE POLYMER COMPOSITION, PATTERN MANUFACTURING METHOD AND ELECTRONIC COMPONENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a photoconductive polymer composition excellent in sensitivity, resolution and preservation stability. <P>SOLUTION: The photoconductive polymer composition contains the following components (a)-(d). The component (a) is an aqueous alkaline solution-soluble polyamide having a structure unit represented by formula (I). The component (b) is a compound for generating an acid by light. The component (c) is a phenol compound having an alkoxymethyl group. The component (d) is a phenol compound having a methylol group. U is a tetravalent organic group, and V is a bivalent organic group in formula (I). <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011141323(A) 申请公布日期 2011.07.21
申请号 JP20100000505 申请日期 2010.01.05
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD 发明人 ONO TAKASHI;MINEGISHI TOMONORI
分类号 G03F7/023;C08G69/26;G03F7/004;H01L21/027 主分类号 G03F7/023
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