发明名称 |
PHOTOCONDUCTIVE POLYMER COMPOSITION, PATTERN MANUFACTURING METHOD AND ELECTRONIC COMPONENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoconductive polymer composition excellent in sensitivity, resolution and preservation stability. <P>SOLUTION: The photoconductive polymer composition contains the following components (a)-(d). The component (a) is an aqueous alkaline solution-soluble polyamide having a structure unit represented by formula (I). The component (b) is a compound for generating an acid by light. The component (c) is a phenol compound having an alkoxymethyl group. The component (d) is a phenol compound having a methylol group. U is a tetravalent organic group, and V is a bivalent organic group in formula (I). <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011141323(A) |
申请公布日期 |
2011.07.21 |
申请号 |
JP20100000505 |
申请日期 |
2010.01.05 |
申请人 |
HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD |
发明人 |
ONO TAKASHI;MINEGISHI TOMONORI |
分类号 |
G03F7/023;C08G69/26;G03F7/004;H01L21/027 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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