发明名称 |
VACUUM CONTROL SYSTEM AND VACUUM CONTROL METHOD |
摘要 |
This invention provides a vacuum control system using a vacuum pump to control a vacuum pressure and a flow of a processing gas in a vacuum chamber. The vacuum control system includes: a plurality of vacuum control valves, each of the valves being connected between each of a plurality of gas discharge ports and the vacuum pump; a pressure measurement unit configured to measure the vacuum pressure of the processing gas supplied to the object; and a controller configured to manipulate respective openings of the valves in accordance with the measured vacuum pressure.
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申请公布号 |
US2011174380(A1) |
申请公布日期 |
2011.07.21 |
申请号 |
US20110986119 |
申请日期 |
2011.01.06 |
申请人 |
CKD CORPORATION |
发明人 |
ITAFUJI HIROSHI;KOUKETSU MASAYUKI |
分类号 |
F15D1/00;F16K1/00;F16K31/02 |
主分类号 |
F15D1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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