发明名称 SILICON MATERIAL USED IN MANUFACTURE OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a silicon material stably applied to an evaporation source, generating splash as less as possible. SOLUTION: In the bar-like silicon material used for feeding silicon to the evaporation source upon manufacturing a thin film, a plurality of first regions, each of which is surrounded by a grain boundary, are present at positions of 90% of the length from the center toward the outer circumference on a cross-section perpendicular to the long axis direction of the material, a plurality of second regions, each of which is surrounded by a grain boundary, are present at positions of 50% of the length from the center toward the outer circumference, the area weighted average value of the long diameters of the first regions is 200μm or less, and the area weighted average value of the long diameters of the second regions is 1,000μm or more. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011140718(A) 申请公布日期 2011.07.21
申请号 JP20110085230 申请日期 2011.04.07
申请人 PANASONIC CORP 发明人 KAMIYAMA YUMA;HONDA KAZUYOSHI;SHINOKAWA TAIJI
分类号 C23C14/24 主分类号 C23C14/24
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