发明名称 PHOTO RESIST COMPOSITION HAVING GOOD RESOLUBILITY
摘要 PURPOSE: A photo-sensitive resin composition with the superior resolubility is provided to improve the quality of a liquid crystal display device by overcoming remained resist-related problems. CONSTITUTION: A photo-sensitive resin composition includes 1 to 10 weight% of a hindered amine-based compound, 1 to 20 weight% of alkaline soluble binder, 1 to 20 weight% of a polymerizable compound with an ethylenically unsaturated bond, 0.5 to 10 weight% of an initiator, and 60 to 90 weight% of a solvent. The hindered amine-based compound functions as a thermal polymerization inhibitor by being selected from a group including TINUVIN 292, TINUVIN 123, TINUVIN 144, TINUVIN 152, TINUVIN 5050, TINUVIN 5060, and TINUVIN 5151.
申请公布号 KR20110083411(A) 申请公布日期 2011.07.20
申请号 KR20100003622 申请日期 2010.01.14
申请人 LG CHEM. LTD. 发明人 PARK, HEE KWAN;PARK, KWANG HAN;LEE, KI YOUL;CHOI, KYUNG SOO;NAM, MOON JA;CHO, CHANG HO;KIM, MIN JUNG;SEO, SANG HYUK;LEE, SEUNG WOO
分类号 G03F7/027;G03F7/004 主分类号 G03F7/027
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