A SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME

摘要

PURPOSE: A semiconductor integrated circuit device and a manufacturing method thereof are provided to form a stopper film which functions as a reflection preventing film on the lower layer of a photoresist film, thereby preventing the lowering of resolution due to exposed light. CONSTITUTION: A first wire(19) is formed around a semiconductor substrate. A first barrier insulating film(21) is formed on the first wire. A first interlayer insulating film(23) is formed on the first barrier insulating film. A first via hole(38) is formed on the first barrier insulating film. A first wire groove(42) is connected to the first via hole.