| 摘要 |
PURPOSE: A substrate drying device and substrate drying method are provided to prevent the concentration of chemical liquid dissolved in supercritical fluid, thereby shortening the time for drying a substrate by using the supercritical fluid. CONSTITUTION: A substrate is dried in a chamber(110). A chemical liquid supply unit(120) supplies chemical liquid onto the substrate to keep the substrate wet. A supercritical fluid supply unit(130) supplies supercritical fluid, whose phase is changed, from a drying gas to the chamber unit. The supercritical fluid supply unit includes a gas supply unit(131), a chemical liquid converting unit(132,133), and a supercritical fluid converting unit(135). A chemical liquid displacing unit(140) supplies the supercritical fluid, whose phase is changed, from the drying gas to the chamber.
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