发明名称 |
METHOD AND APPARATUS FOR ENHANCING SIGNAL STRENGTH FOR IMPROVED GENERATION AND PLACEMENT OF MODEL-BASED SUB-RESOLUTION ASSIST FEATURES (MB-SRAF). |
摘要 |
Model-Based Sub-Resolution Assist Feature (SRAF) generation process and apparatus are disclosed, in which an SRAF guidance map (SGM) is iteratively optimized to finally output an optimized set of SRAFs as a result of enhanced signal strength obtained by iterations involving SRAF polygons and SGM image. SRAFs generated in a prior round of iteration are incorporated in a mask layout to generate a subsequent set of SRAFs. The iterative process is terminated when a set of SRAF accommodates a desired process window or when a predefined process window criterion is satisfied. Various cost functions, representing various lithographic responses, may be predefined for the optimization process.
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申请公布号 |
NL2005804(A) |
申请公布日期 |
2011.07.18 |
申请号 |
NL20102005804 |
申请日期 |
2010.12.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
TSAI, MIN-CHUN;CHEN, BEEN-DER;LU, YEN-WEN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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地址 |
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