发明名称 METHOD AND APPARATUS FOR ENHANCING SIGNAL STRENGTH FOR IMPROVED GENERATION AND PLACEMENT OF MODEL-BASED SUB-RESOLUTION ASSIST FEATURES (MB-SRAF).
摘要 Model-Based Sub-Resolution Assist Feature (SRAF) generation process and apparatus are disclosed, in which an SRAF guidance map (SGM) is iteratively optimized to finally output an optimized set of SRAFs as a result of enhanced signal strength obtained by iterations involving SRAF polygons and SGM image. SRAFs generated in a prior round of iteration are incorporated in a mask layout to generate a subsequent set of SRAFs. The iterative process is terminated when a set of SRAF accommodates a desired process window or when a predefined process window criterion is satisfied. Various cost functions, representing various lithographic responses, may be predefined for the optimization process.
申请公布号 NL2005804(A) 申请公布日期 2011.07.18
申请号 NL20102005804 申请日期 2010.12.02
申请人 ASML NETHERLANDS B.V. 发明人 TSAI, MIN-CHUN;CHEN, BEEN-DER;LU, YEN-WEN
分类号 G03F7/20 主分类号 G03F7/20
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