| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a pattern having superior CD uniformity by using resin in a resist composition. <P>SOLUTION: The resist composition is provided which contains the resin and acid generators represented by formula (1) and formula (2), wherein Q<SP>1</SP>-Q<SP>4</SP>each independently represent F or 1-6C perfluoroalkyl; X<SP>1</SP>and X<SP>2</SP>each independently represent a single bond or a divalent 1-17C saturated hydrocarbon group; Y<SP>1</SP>represents a 3-36C saturated cyclic hydrocarbon group which may be substituted by alkyl; Y<SP>2</SP>represents a 3-36C saturated cyclic hydrocarbon group in which at least one H has been substituted by hydroxy or 1-6C hydroxyalkyl or a cyclic group having a 3-36C lactone skeleton, a 3-36C cyclic ketone skeleton or a 3-36C sultone skeleton: P<SP>1</SP>-P<SP>3</SP>each independently represent a 3-36C aromatic hydrocarbon group which may have a substituent or a 1-6C aliphatic hydrocarbon group which may have a substituent, and two or P<SP>1</SP>-P<SP>3</SP>may bond to each other to form a ring. <P>COPYRIGHT: (C)2011,JPO&INPIT |
