| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a stock chamber therefor capable of efficiently producing substrates without any influence on a step of removing a film deposited on the surface of a substrate holder and a step of changing the substrate holder, or on a step of removing the film or a step of changing the substrate holder by providing a substrate holder storage chamber for storing a plurality of substrate holders in a conveying passage of the film deposition apparatus. SOLUTION: The film deposition apparatus comprises: a plurality of vacuum chambers connected to each other in a vacuum state; a conveying passage provided in the plurality of vacuum chambers; a plurality of substrate holders movable along the conveying passage; a driving instrument for moving the substrate holders; and the stock chamber capable of collecting the substrate holders from the conveying passage and/or feeding the substrate holders to the conveying passage, and connected to one of the plurality of vacuum chambers. The stock chamber has a structure capable of arranging the substrate holders in a vertical state around a center axis of a turning mechanism. COPYRIGHT: (C)2011,JPO&INPIT |
