发明名称 |
Patterning Method of Metal Oxide Thin Film Using Nanoimprinting, and Manufacturing Method of Light Emitting Diode |
摘要 |
Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern. Within this, there is provided a method for forming a metal dioxe thin film pattern using nano imprinting, which makes it possible to simplify the process for forming the pattern since the process of separately applying the ultraviolet resin to be used as the resist can be omitted, and forms a micro/nano composite pattern through a single imprint process.
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申请公布号 |
US2011169027(A1) |
申请公布日期 |
2011.07.14 |
申请号 |
US20100698194 |
申请日期 |
2010.02.02 |
申请人 |
KOREA INSTITUTE OF MACHINERY & MATERIALS |
发明人 |
PARK HYEONG-HO;JEONG JUN-HO;KIM KI-DON;CHOI DAE-GEUN;CHOI JUN-HYUK;LEE JI-HYE;LEE SOON-WON |
分类号 |
H01L33/58;B29C59/16;C23C14/28;D06N7/04;H05B6/00 |
主分类号 |
H01L33/58 |
代理机构 |
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