发明名称 TWO-PHOTON ABSORPTION THIN FILM AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a two-photon absorption thin film that significantly increases sensitization of two-photon absorption characteristics, and to provide a method of manufacturing the same. SOLUTION: The method includes: a step of immersing a substrate [10] the surface of which is charged in an aqueous coating solution containing organic polymer ions (a) having charges with polarity opposite to that of the substrate and metal nanoparticles, and drying it to obtain a thin film [11]; a step of immersing the substrate in the aqueous coating solution containing the organic polymer ions (b) having charges with polarity opposite to that of (a) and two-photon absorption materials, and being drying it to obtain a thin film [12]; or, a step of immersing the substrate the surface of which is charged in the aqueous coating solution containing the organic polymer ions (b) having charges with polarity opposite to that of the substrate and two-photon absorption materials, and drying it to obtain the thin film [12]; and a step of immersing the substrate in the aqueous coating solution containing the organic polymer ions (a) having charges with polarity reverse to that of the (b) and metal nanoparticles, and drying it to obtain a thin film [11]. Thereby, the two-photon absorption thin film is obtained which includes an interlamination thin film of the thin film [11] and the thin film [12] on the substrate [10]. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011138067(A) 申请公布日期 2011.07.14
申请号 JP20090299150 申请日期 2009.12.29
申请人 RICOH CO LTD 发明人 SATO TSUTOMU;MIKI TAKESHI
分类号 G02F1/355;C08L101/00 主分类号 G02F1/355
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