发明名称 APPARATUS SUITABLE FOR CONTACTING GASES AT HIGH TEMPERATURE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an apparatus suitable for contacting gases at high temperature, such as hydrogen with tetrachlorosilane. <P>SOLUTION: A reactor 100 is used for hydrogenating tetrachlorosilane. The reactor 100 has at least one part fabricated from a silicon carbide-based material of construction. The reactor 100 includes: a pressurizable shell 101; a thermal insulator 102 surrounded by the pressurizable shell 101; a heating element 106 surrounded by the thermal insulator 102; and a reaction chamber 107 surrounded by the heating element 106. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011136904(A) 申请公布日期 2011.07.14
申请号 JP20110075636 申请日期 2011.03.30
申请人 HEMLOCK SEMICONDUCTOR CORP 发明人 AGRAWAL MANOJ;BAUER DANA;PIPPENGER ROBERT
分类号 B01J3/00;C01B33/03;B01J3/04;B01J19/00;B01J19/02;B01J19/24;C01B33/107 主分类号 B01J3/00
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