发明名称 |
APPARATUS SUITABLE FOR CONTACTING GASES AT HIGH TEMPERATURE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus suitable for contacting gases at high temperature, such as hydrogen with tetrachlorosilane. <P>SOLUTION: A reactor 100 is used for hydrogenating tetrachlorosilane. The reactor 100 has at least one part fabricated from a silicon carbide-based material of construction. The reactor 100 includes: a pressurizable shell 101; a thermal insulator 102 surrounded by the pressurizable shell 101; a heating element 106 surrounded by the thermal insulator 102; and a reaction chamber 107 surrounded by the heating element 106. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
申请公布号 |
JP2011136904(A) |
申请公布日期 |
2011.07.14 |
申请号 |
JP20110075636 |
申请日期 |
2011.03.30 |
申请人 |
HEMLOCK SEMICONDUCTOR CORP |
发明人 |
AGRAWAL MANOJ;BAUER DANA;PIPPENGER ROBERT |
分类号 |
B01J3/00;C01B33/03;B01J3/04;B01J19/00;B01J19/02;B01J19/24;C01B33/107 |
主分类号 |
B01J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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