| 摘要 |
PURPOSE: An apparatus for drying a substrate is provided to reduce a time and costs for manufacturing a substrate by performing a first drying process through a wiper and a second drying process through an air knife. CONSTITUTION: In an apparatus for drying a substrate, a substrate(10) is dried in a dry chamber(110). A substrate transfer unit transfer(120) a substrate in horizontal direction by using a plurality of transfer rollers. A wiper(130) is extended to opposite direction to the transfer direction of the substrate and intercepts a part of water on a substrate while the substrate is transferred to remove the wafer form the substrate. An air knife is arranged in the rear part of the wiper and remove remaining water from the substrate.
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