| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus that ensures that a light source is cooled and does not cause a problem of a negative effect on human body while preventing the deposition of soils due to sulfides and sublimates created on a substrate surface. <P>SOLUTION: The lithographic apparatus includes a light source side unit 100 having a light source 11 to be cooled, and an optical system side unit 200 having an optical element that guides light from the light source 11 to an object to be exposed to light. In the lithographic apparatus, a window member 10 transmits light from the light source side unit 100. The optical system side unit 200 is sealed substantially to have an internal pressure kept higher than an external pressure. The light source side unit 100 is provided with a nozzle 14 from which an inert gas is sent to the window member 10. The inert gas is applied locally and continuously to the surface of the window member 10 to keep a high concentration of nitrogen gas in a surface atmosphere of the window member 10. This reduces impurities, such as a sulfides, and oxygen, thus significantly reducing blurs arising on the window member 10. <P>COPYRIGHT: (C)2011,JPO&INPIT |
