| 摘要 |
PROBLEM TO BE SOLVED: To provide a vibration isolation system for an imprint lithographic apparatus, capable of improving a throughput of an imprint lithographic apparatus. SOLUTION: An imprint lithographic apparatus 100 includes an actuator 130 displacing an imprint template holder 110 relative to a substrate holder 120. A support structure 140 of the imprint template holder 110 and/or the substrate holder 120 is attached to a vibration isolation system 150 attached to a base 160. The vibration isolation system 150 isolates vibration of the support structure 140 relative to the base 160. A control unit controlling the actuator 130 in an imprint process controls an adjusting member of the vibration isolation system 150, and adjusts a dynamic characteristic of the vibration isolation system 150 during at least part of the imprint process to reduce a displacement of the support structure 140 relative to the base 160, the displacement being caused by a force acting the support structure 140. COPYRIGHT: (C)2011,JPO&INPIT |
