| 摘要 |
PURPOSE: An atomic layer deposition apparatus for the deposition of a multi-component layer is provided to prevent the size of a gas injection unit and the atomic layer deposition apparatus from being increased. CONSTITUTION: An atomic layer deposition apparatus for the deposition of a multi-component layer comprises a gas injection unit. The gas injection unit comprises multiple injection modules(131) which inject multiple source gases to a substrate. The source gases are different from each other. Each injection module comprises first, second, and third shells(310,320,330,340). The first and second shells are vertically coupled to each other. The third shells are arranged inside the first and second shells. The third shells divide the inner space of the injection module into multiple buffer units(301,302,303,304) and have multiple injection holes(321,331,341).
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