发明名称 |
MEMBER WITH PROTECTIVE FILM FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING RESIST PATTERN |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a member for forming a resist pattern with a new protective film formed on the member. <P>SOLUTION: The member with a protective film for forming a resist pattern comprises: a member for forming a resist pattern having a surface containing an oxide and used by adhering to a resist film 2 for forming a resist pattern; and a protective film 4 formed on the member for forming the resist pattern which contains a straight-chain amphiphilic molecule containing a perfluoro polyether in a main chain and a hydroxyl group in a terminal group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011133750(A) |
申请公布日期 |
2011.07.07 |
申请号 |
JP20090294532 |
申请日期 |
2009.12.25 |
申请人 |
FUJITSU LTD |
发明人 |
KON JUNICHI;CHIBA HIROSHI |
分类号 |
B29C33/38;G03F1/48;G03F7/20;H01L21/027 |
主分类号 |
B29C33/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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