发明名称 MEMBER WITH PROTECTIVE FILM FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING RESIST PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a member for forming a resist pattern with a new protective film formed on the member. <P>SOLUTION: The member with a protective film for forming a resist pattern comprises: a member for forming a resist pattern having a surface containing an oxide and used by adhering to a resist film 2 for forming a resist pattern; and a protective film 4 formed on the member for forming the resist pattern which contains a straight-chain amphiphilic molecule containing a perfluoro polyether in a main chain and a hydroxyl group in a terminal group. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011133750(A) 申请公布日期 2011.07.07
申请号 JP20090294532 申请日期 2009.12.25
申请人 FUJITSU LTD 发明人 KON JUNICHI;CHIBA HIROSHI
分类号 B29C33/38;G03F1/48;G03F7/20;H01L21/027 主分类号 B29C33/38
代理机构 代理人
主权项
地址
您可能感兴趣的专利