| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition which exhibits excellent uniformity in film thickness and has high radiation sensitivity even if a slit coating method is adopted as a coating method, and has such a development margin that a favorable pattern shape can be formed even if an optimal developing time has elapsed passed in a developing step, and an interlayer insulating film having various excellent performance such as high heat and solvent resistance, high transmittance and a low dielectric constant. <P>SOLUTION: The radiation sensitive resin composition comprises: (A) an alkali-soluble resin, (B) a 1,2-quinonediazide compound; and (C) a specific polymer having a silicone chain. The interlayer insulating film is formed of the radiation sensitive resin composition. <P>COPYRIGHT: (C)2011,JPO&INPIT |
