发明名称 PHOTOMASK
摘要 <P>PROBLEM TO BE SOLVED: To improve the efficiency of using light applied to a body to be exposed to light. <P>SOLUTION: A photomask includes a mask substrate 2 where a plurality of mask patterns 5 in a prescribed shape are formed on a lower surface 4a of a transparent substrate 4, and a microlens array 3 that forms a plurality of projection lenses 10 for performing reduced projection of images of the plurality of mask patterns 5 onto the body to be exposed to light which is disposed opposingly on a lower surface 9a of a separate transparent substrate 9, and forms a plurality of field lenses 11 for condensing incident light to the projection lenses 10 on an upper surface 9b by matching light axes of the projection lenses 10. While the mask patterns 5 and the field lenses 11 are closely opposed with a prescribed interval, the mask substrate 2 and the microlens array 3 are bonded. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011134768(A) 申请公布日期 2011.07.07
申请号 JP20090290651 申请日期 2009.12.22
申请人 V TECHNOLOGY CO LTD 发明人 MIZUMURA MICHINOBU;HATANAKA MAKOTO
分类号 H01L21/027 主分类号 H01L21/027
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