| 摘要 |
PURPOSE: A method for compensating the planarity of a stage and substrate inspecting device is provided to measure and compensate the planarity of the stage. CONSTITUTION: A method for compensating the planarity of a stage and substrate inspecting device comprises a stage and a detection member. A substrate is settled on the stage. A detection member measures the planarity of the circumference per a location of the stage. A laser displacing sensor(93) is moved by a moving part(91).
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