发明名称 HIGH-VOLTAGE POWER TRANSISTOR USING SOI TECHNOLOGY
摘要 The power transistor configured to be integrated into a trench-isolated thick layer SOI-technology with an active silicon layer with a thickness of about 50μm. The power transistor may have a lower resistance than the DMOS transistor and a faster switch-off behavior than the IGBT.
申请公布号 US2011156093(A1) 申请公布日期 2011.06.30
申请号 US20090999028 申请日期 2009.06.15
申请人 X-FAB SEMICONDUCTOR FOUNDRIES AG 发明人 LERNER RALF
分类号 H01L29/739;H01L21/331 主分类号 H01L29/739
代理机构 代理人
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