| 发明名称 |
METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS |
| 摘要 |
Provided are methods of forming photolithographic patterns using a negative tone development process. Also provided are coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.
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| 申请公布号 |
US2011159253(A1) |
申请公布日期 |
2011.06.30 |
| 申请号 |
US201113042371 |
申请日期 |
2011.03.07 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
KANG SEOKHO;CUTLER CHARLOTTE |
| 分类号 |
G03F7/004;B32B3/10;G03F7/20 |
主分类号 |
G03F7/004 |
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