EXPOSURE METHOD, AND EXPOSURE DEVICE

摘要

Provided are an exposure device and an exposure method wherein it is possible to create a color filter which has no defects even if the positional deviation in the substrate transfer direction is large. The exposure method involves arranging a substrate (202), which is coated with a resist, and a photomask (102) in a manner such that the substrate (202) and the photomask (102) face a blinking light source which repeatedly turns on and off. While continuously transferring the substrate (202) in the direction which is perpendicular to the arrangement direction of the openings (112) disposed on the photomask (102), the blinking light source turns on and off, thereby intermittently exposing the substrate (202) to light multiple times. During each exposure, the transfer speed of the substrate (202) is controlled in a manner such that the openings (112) of the photomask (102) overlap with a portion of the previous exposure patterns (122), thereby forming a stripe-shaped colored layer (802) which extends in the transfer direction of the substrate (202).