AMORPHOUS CARBON ORIENTATION FILM AND FORMATION METHOD THEREFOR

摘要

Disclosed is an amorphous carbon orientation film that uses carbon as the main component, includes 3 to 20 atomic percent of nitrogen and in the range of more than 0 atomic percent to 20 atomic percent of hydrogen, and has in the range of 70 atomic percent to less than 100 atomic percent of carbon having an sp2 hybrid orbital (Csp2) when the total amount of carbon is 100 atomic percent, wherein the (002) surface of graphite is oriented along the thickness direction. The film has a novel structure and high conductivity. The film can be formed by means of a direct plasma CVD method in which a reactant gas comprising a nitrogen gas and at least one type of compound gas selected from a carbocycle gas that comprises Csp2 and a nitrogen heterocycle gas that comprises Csp2 as well as nitrogen and/or silicon is discharged at 1500 V or more.