发明名称 SOURCE GAS CONCENTRATION CONTROL SYSTEM
摘要 PURPOSE: A source gas concentration control system is provided to control the concentration of source gas even when the opening degree of a first valve reaches the limit by increasing the set temperature and the partial pressure of the source gas. CONSTITUTION: A source gas concentration control system comprises a first valve(23), a concentration sensor(CS), a concentration control unit(CC), a temperature control unit(41), and a temperature setting unit(42). The first valve is prepared on a delivery pipe. The concentration sensor measures the concentration of source gas in a mixed gas. The concentration control unit controls the opening degree of the first valve to achieve the set concentration of source gas. The temperature control unit controls the internal temperature of the tank to the set temperature. The temperature setting unit determines the set temperature of the temperature controller.
申请公布号 KR20110074459(A) 申请公布日期 2011.06.30
申请号 KR20100132410 申请日期 2010.12.22
申请人 HORIBA, LTD.;HORIBA STEC, CO., LTD. 发明人 MINAMI MASAKAZU;INOUE MASAKI
分类号 C23C16/448;H01L21/205 主分类号 C23C16/448
代理机构 代理人
主权项
地址
您可能感兴趣的专利