| 摘要 |
A substrate handling device 14' for loading and unloading a substrate into and out of the main chamber (4, Fig 2) of a charge particle beam system, the device 14' comprising a side member 18' extending laterally from a bar 17 which is configured to be translatable along its longitudinal axis parallel to the x-direction. A substrate can be transferred between the substrate handing device 14' and a substrate-supporting structure 13' when said supporting structure 13' is in a loading/unloading position 27 at a limit of its field of travel in the x- and y-directions. The side member 18' is shaped so that, when it is in its loading/unloading position it does not cross the line 35', whereby the substrate-supporting structure 13' is free to move in the y-direction without the side member 18 interfering with the substrate-supporting structure 13' and/or the substrate.
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