<p>An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps (22,25) in the substrate table (WT) by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. The apparatus comprises a device (32) configured to extract liquid, gas or both from the gap. The device configured to extract liquid, gas or both comprises a membrane configured to allow gas but not liquid to be extracted from the gap.</p>
申请公布号
EP2339404(A2)
申请公布日期
2011.06.29
申请号
EP20110162784
申请日期
2006.04.28
申请人
ASML NETHERLANDS BV
发明人
STREEFKERK, BOB;DONDERS, SJOERD;DE GRAAF, ROELOF;HOOGENDAM, CHRISTIAAN;LEENDERS, MARTINUS;MERTENS, JEROEN;RIEPEN, MICHEL