发明名称 Nano imprint master and method of manufacturing the same
摘要 A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
申请公布号 US7968253(B2) 申请公布日期 2011.06.28
申请号 US20070745609 申请日期 2007.05.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM HAE-SUNG;KO HYOUNG-SOO;HONG SEUNG-BUM;SOHN JIN-SEUNG;CHOA SUNG-HOON;LIM CHEE-KHENG
分类号 G03F1/00 主分类号 G03F1/00
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