发明名称 Electrical test structure to detect stress induced defects using diodes
摘要 A serpentine double gated diode array for monitoring stress induced defects is disclosed. The diode array is configured with adjacent gate segments and gate loops in close proximity to active areas to maximize a sensitivity to stress induced defects. The diode array is compatible with conventional electrical testing. Scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy (SSRM) may be used to isolate individual stress induced defects. Variations in the gate configuration allow estimation of effects of circuit layout on formation of stress induced defects.
申请公布号 US7968878(B2) 申请公布日期 2011.06.28
申请号 US20090537685 申请日期 2009.08.07
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 AGGARWAL RAJNI J.;WANG YUGUO
分类号 H01L29/10;H01L21/66 主分类号 H01L29/10
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