LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE.,申请号NL20102005821-传众专利搜索

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发明名称	LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE.
摘要
申请公布号	NL2005821(A)	申请公布日期	2011.06.27
申请号	NL20102005821	申请日期	2010.12.06
申请人	ASML NETHERLANDS B.V.,	发明人	STAALS, FRANK;KERKHOF, MARCUS
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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