| 摘要 |
PURPOSE: A thin film solar cell and a manufacturing method thereof are provided to shorten process time by using a nano wire with self-reflection effect instead of a transparent conductive oxide thin film without an additional sputtering apparatus. CONSTITUTION: A transparent electrode layer(103) is formed on a transparent substrate(101). A semiconductor layer(105) is formed on the transparent electrode layer. The semiconductor layer is comprised of a p+ amorphous silicon layer(105p), an intrinsic amorphous silicon layer(105i), and an amorphous silicon layer(105n). An n+ amorphous silicon layer is formed on a nano wire layer(107). A rear electrode layer(109) is formed on the nano wire layer. |
