摘要 |
Methods and apparatus for processing substrates are disclosed herein. In some embodiments, an apparatus for processing a substrate may include a substrate support having a base having a convex surface, an annular ring disposed on the base, and an edge ring disposed on the annular ring to support a substrate, wherein the base, annular ring, and edge ring form a radiant cavity capable of reflecting energy radiated from a backside of a substrate when disposed on the edge ring and wherein the backside of the substrate faces the convex surface of the base. Alternatively or in combination, in some embodiments, the base may include a metal layer encapsulated between a transparent non-metal upper layer and a non-metal lower layer. |
申请人 |
APPLIED MATERIALS, INC.;CARLSON, DAVID, K.;SANCHEZ, ERROL;DINIZ, HERMAN;KUPPURAO, SATHEESH |
发明人 |
CARLSON, DAVID, K.;SANCHEZ, ERROL;DINIZ, HERMAN;KUPPURAO, SATHEESH |