METHOD AND APPARATUS FOR POLISHING PLATE-LIKE MATERIAL

摘要

Disclosed is a polishing method having improved operation efficiency in a polishing step without being affected by generation state of surface defects (17) on a glass plate (G) surface to be polished. The distribution state of the surface defects (17) of the glass plate (G) sucked to a suction sheet (3) on a table (2) is previously inspected, said distribution being in the Y axis direction within the surface, more polishing heads (5) that polish the surface of the glass plate (G) are disposed in a polishing lane (LB), which is a region where more surface defects (17) are present compared with a polishing lane (LA), i.e., a region having less surface defects (17), and the surface of the glass plate (G) is polished by moving the glass plate in the X axis direction.