METHOD FOR FORMING METAL ELECTRODE

摘要

PURPOSE: A method for manufacturing a metal electrode is provided to form a metal electrode with a narrow line and easily form a nano pattern in a wide area by using a nano imprinting process and a self assembled monolayer. CONSTITUTION: A method for manufacturing a metal electrode comprises the following steps. A pre-sacrificial film pattern is formed on a substrate using an imprinting process(S1). The pre-sacrificial film pattern is etched to form a sacrificial film pattern having a width narrower than that of the pre-sacrificial film pattern(S2). A self assembled monolayer pattern is selectively formed on the substrate exposed by the sacrificial film pattern(S3). The sacrificial film pattern is removed(S4). A metal electrode is selectively formed on the substrate exposed by the self assembled monolayer pattern(S5).