| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having superior lithographic characteristics and suppressing film reduction during pattern formation, a polymer compound useful as a base component of the positive resist composition, a compound which is useful as a monomer, as well as, a method for forming a pattern. <P>SOLUTION: The positive resist composition contains a base component (A), of which the solubility in an alkali developing solution is increased by the action of an acid and an acid generator component (B) generating an acid by exposure, wherein the base component (A) contains a polymer compound (A1), having a structural unit which is an acrylic compound having a dissociable group that includes a naphthalene ring. <P>COPYRIGHT: (C)2011,JPO&INPIT |
