METHOD FOR MAINTAINING SUBSTRATE PROCESSING APPARATUS, AND SAFETY APPARATUS FOR SUBSTRATE PROCESSING APPARATUS

摘要

Disclosed is a substrate processing apparatus wherein a drive area (DA1) is partitioned from the peripheral area (SA1) of the drive area with a partitioning section (52), said drive area being covered with a chamber main body section (51), and having disposed therein a drive section that performs predetermined operations so as to process a substrate. Also disclosed is a method for maintaining the substrate processing apparatus, which includes: a first step wherein, prior to opening a first door (DR1) that closes a first opening provided in the chamber main body section (51), an X-ray irradiation apparatus (20) is brought into a state wherein the apparatus cannot radiate x-rays; a second step wherein, after the first door (DR1) is closed but prior to opening a second door (DR2) that closes a second opening provided in the partitioning section (52), the drive section is brought into a state wherein the drive section cannot perform predetermined operations; and a maintenance step wherein the drive section and/or the processing section is maintained, said drive section and/or processing section having been brought into the state wherein the drive section and/or the processing section cannot perform the predetermined operations. Thus, checking by, for instance, observation of the drive state of the drive section, can be safely performed in a chamber.