| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of at least reducing the possibility of mixing of bubbles. <P>SOLUTION: An immersion lithographic apparatus is disclosed. The immersion lithographic apparatus includes a fluid handling system which confines immersion liquid to be within a local space between a final element of a projection system and a substrate and/or a table, and a gas supply device which supplies gas of which solubility in the immersion liquid is higher than 5x10<SP>-3</SP>mol/kg, at a total pressure of 1 atm and 20°C into a region that adjoins the space. <P>COPYRIGHT: (C)2011,JPO&INPIT |
